Quantification of Control for EUV and FUV Surfaces for HWO Mirrors and Submonolayer Cleanliness Using XPS and Ellipsometry
HAMILTON J. 1,2, VAWDREY J. 3, ALLRED D. 3
1 University of Wisconsin-Platteville, PLATTEVILLE, United States; 2 Photonic Cleaning Technologies, Platteville, United States; 3 Brigham Young University Physics, Provo, Utah, United States